IEC-62374-1 › Semiconductor devices - Part 1: Time-dependent dielectric breakdown (TDDB) test for inter-metal layers
IEC-62374-1
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EDITION 1.0
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CURRENT
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IEC 62374-1:2010 describes a test method, test structure and lifetime estimation method of the time-dependent dielectric breakdown (TDDB) test for inter-metal layers applied in semiconductor devices.
To find similar documents by classification:
31.080 (Semiconductor devices Semiconducting materials, see 29.045)
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Document Number
IEC 62374-1 Ed. 1.0 b:2010
Revision Level
EDITION 1.0
Status
Current
Publication Date
Sept. 1, 2010
Committee Number
47