DIN-EN-62047-16 › Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods (IEC 62047-16:2015); German version EN 62047-16:2015

DIN-EN-62047-16 - 2015 EDITION - CURRENT



Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods (IEC 62047-16:2015); German version EN 62047-16:2015


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Document Number

DIN EN 62047-16:2015-12

Revision Level

2015 EDITION

Status

Current

Publication Date

Dec. 1, 2015