ASTM-F154 › Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)

ASTM-F154 - 2002 EDITION - SUPERSEDED
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Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)
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This standard was transferred to SEMI (www.semi.org) May 2003

1.1 The purpose of this guide is to list, illustrate, and provide reference for various characteristic features and contaminants that are seen on highly specular silicon wafers. Recommended practices for delineation and observation of these artifacts are referenced. The artifacts described in this guide are intended to parallel and support the content of the SEMI M18. These artifacts and common synonyms are arranged alphabetically in Tables 1 and 2 and illustrated in Figs. 1-68 .

Keywords

contaminant; defects; dislocation; epitaxial; fracture; preferential etch; scratch; shallow pit; silicon; slip; stacking fault; ICS Number Code 17.040.20 (Properties of surfaces)

To find similar documents by ASTM Volume:

10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)

To find similar documents by classification:

17.040.20 (Properties of surfaces)

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Document Number

ASTM-F154-02

Revision Level

2002 EDITION

Status

Superseded

Modification Type

Withdrawn

Publication Date

Jan. 10, 2001

Document Type

Guide

Page Count

13 pages

Committee Number

F01.06