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Scope

1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets).

1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging.

1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.

Keywords

aluminum; coating; evaporation; sputtering; targets; thin films; vacuum coating; Aluminum electrical conductors (semiconductors); Electronic materials/applications--specifications; Electronic thin-film applications--specifications; Evaporators/evaporation--specifications; Sputtering process/targets--specifications; Targets; Vacuum electronic applications; ICS Number Code 31.200 (Integrated circuits. Microelectronics)

To find similar documents by ASTM Volume:

10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)

To find similar documents by classification:

31.200 (Integrated circuits. Microelectronics Including electronic chips, logical and analogue microstructures Microprocessors, see 35.160)

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