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Scope

This standard was transferred to SEMI (www.semi.org) May 2003

1.1 This terminology covers terms and definition used in relation to semiconductor grade silicon crystal and wafers.

1.2 This terminology covers terms describing attributes of silicon wafers as specified in SEMI Specifications M1 and SEMI Format M18. These attributes include electrical, structural, chemical, and mechanical characteristics of polished and epitaxial wafers as well as surface defects and contamination.

1.3 This terminology is applicable for use in connection with research, developement, process control, procurement, and inspection of silicon material.

1.4 Originally the terms and definitions included in this standard were extracted from other ASTM Standards relating to silicon technology. The original source standards for such terms are identified by their designations immediately following the definition. All such standards are found in this volume of the Annual Book of ASTM Standards . More recently, new or revised terms and definitions have been balloted directly for inclusion in this standard; these terms have no designation following the definition.

1.5 Almost all of the terms listed are nouns; in other cases, the part of speech is given explicitly immediately following the term.

Keywords

crystals; epitaxial wafers; polished wafers; semiconductor; silicon; terminology; ICS Number Code 01.040.29 (Electrical engineering (Vocabularies)); 29.045 (Semiconducting materials)

To find similar documents by ASTM Volume:

10.04 (Electronics; Declarable Substances in Materials; 3D Imaging Systems)

To find similar documents by classification:

01.040.29 (Electrical engineering (Vocabularies))

29.045 (Semiconducting materials)

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